Products: Plasma
March CS_1701 RIE
Technical Synopsis
The March CS-1701 Reactive Ion Etch (RIE) system delivers high end metal etching, silicide etching and etching of III-V compounds, anisotropic etching of oxcides, nitrates and polyimides.
Reactor Module
Gas Handling Module
RF Generator
10″D x 1.5″ H (25.4 x 3.8 cm) hard anodized aluminum
Holds on 4″ or 6″ wafer, 8″ capability optional
0-600 watts
Automatic tuning
Automatic optical endpoint detection
