Technical Synopsis

The March CS-1701 Reactive Ion Etch (RIE) system delivers high end metal etching, silicide etching and etching of III-V compounds, anisotropic etching of oxcides, nitrates and polyimides.

Reactor Module

Gas Handling Module

RF Generator

10″D x 1.5″ H (25.4 x 3.8 cm) hard anodized aluminum

Holds on 4″ or 6″ wafer, 8″ capability optional

0-600 watts

Automatic tuning

Automatic optical endpoint detection