Products: Plasma
Technics 2000 Macro Stripper
Technical Synopsis
Strips photoresist from wafers through the plasma process.
CFM Mechanical pump (optional)
13.56 MHz RF Generator 200 Watts
Two Gases
120v, 50/60Hz, 15 Amps
User’s Manual
Technical Synopsis
Strips photoresist from wafers through the plasma process.
CFM Mechanical pump (optional)
13.56 MHz RF Generator 200 Watts
Two Gases
120v, 50/60Hz, 15 Amps
User’s Manual
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